I am thinking to investigate the charge manipulation inside CCD matrix by applying an orthogonal electrical filed. I require for this study to create an electrode on top of each CCD pixel. I would like to use ether "standard" 25 micron or larger size of CCD pixels. I envision depositing an intermediate insulation layer on CCD layers and than the electrode layer on top. Please share your experience, thoughts and references. Thanks!
Hello Vladimir, Probably the task depends first of all on the materials that you want to deposit and the critical requirements or limitations for the process. Based on that it is possible to discuss the different options that would be available for that. Thanks, Andrew
Hi Vladimir,
I think that any deposition must be a low temperature technique, becuase you will not be able to heat a working CCD matrix at more elevated temperatures. Therefore, I think that (thermal) evaporation techniques in vacuum will be best suited ... good luck, Dirk
Pulsed vacuum arc, layer by layer, 20 shots and you can have a scratch resistent, and depending on what metal, you can do also a bandpass filter, check the work done for a. Anders on magnesium oxide optical thin films.
Tomasz Thanks! yes the over-layer I envision should be as thin as possible, and it is required just to generate charges in each pixel, so 2-20 microns should work. Yes low temperature CVP, PVD is a way to go. Thanks for suggestion to use a microwave enchained deposition, I have to consider this avenue as well.... I suspect that 200 degrees should be OK as CCD matrix should survive in this condition, but it nice to have options. Thansk again!
It is avery worthwhile processing step if done successfully without affecting the CCD operational parameters.
Narendra thanks a lot for your input, I completely agree with your suggestion!
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