Can someone help me in understanding the mechanism behind the thin film growth during solution-processed techniques like a spin coating? I want to know the details about mechanism like nucleation and growth
The spin coating process is carried out in four steps. In the first step, the solvent solution applied or deposit to the substrate. Then, spin up the substrate around an axis perpendicular to the coating area. This step followed by a spin-off, and finally gelation by evaporation of the solvent solution.
The balance between radially outward centrifugal force and radially inward viscous force the obtained film tends to be uniform and thin.
There are several descriptions of the thickness of the prepared film by the spin coating process. Of these, dependable thickness on the materials and processing parameters such as, solvent solution evaporation and the angular velocity according to the relationship derived by :
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Spin coating is a method to apply a uniform film onto a solid surface by using centrifugal force and requires a liquid-vapor interface. In a typical procedure, a liquid is placed at the center of a circular surface and is rapidly rotated to produce uniform films of 1–10 μm in thickness.
(1) Karpitschka, S.; Weber, C. M.; Riegler, H. Spin Casting of Dilute Solutions: Vertical Composition Profile During Hydrodynamic-Evaporative Film Thinning. Chem. Eng. Sci. 2015, 129, 243-248, DOI: 10.1016/j.ces.2015.01.028.
(2) Danglad-Flores, J.; Eickelmann, S.; Riegler, H. Deposition of Polymer Films by Spin Casting: A Quantitative Analysis. Chem. Eng. Sci. 2018, 179, 257-264, DOI: 10.1016/j.ces.2018.01.012.