Thank you for your clarification Andrei. I have sometimes used "sputtering" and "dry etching" rather interchangeably when referring to Ar ion surface cleaning, but it's probably better to stick to "sputtering".
That means sputtering comes under ion beam erosion,then what about ion beam etching. Do all the three terms have the different application in ion beam field.
Eching is used to remove impureties from the surface with low kinetic enzrgy, irirradiation is used to study the interaction ions matter with modertae energy and erosion can be used for doping the samples or adding ions to the surface.