In case of fabricating the Metal-semiconductor contacts, we use the concepts of electron affinity and work function, where, we  are normally interested in the work function of a metal and electron affinity of semiconductor.

In case of semiconductor, the work function and electron affinity w.r.t vacuum level are different, but why is there no question of electron affinity in the case of metal, where we consider only the work function.

Do the electron affinity and work function of a "metal" are similar?

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