First of all put device in Ethenal(used) for one hour then clean by heth hard as possible not scratch then, Soap Water, ID water, Acteone, Ethonal and IPA for 15mint each step Ultrasonication

Standard procedure: (1) Piranha Cleaning OR (2) RCA-1 cleaning process after that rinsed in running DI-water and dry with Nitrogen gas.

RCA-1: RCA-1 is using for removing organic contamination. Clean the substrate using the mixture of de-ionized water, hydrogen peroxide and ammonium hydroxide in the ratio of 5:1:1 part by volume at 75 degree Celsius for 10 minutes.

Dear Geethanjana Wanigasekara,

(1). Piranha Cleaning.

(2). Plasma treatments with air, O2, N2 or rare gas increase the wettability of ITO. Low-pressure plasmas work as well as corona/APPJ-plasmas. Coating should be done immediately after plasma treatment due to hydrophobic recovery of the ITO surface. You need to optimize the applied power (low) and process time (less) otherwise chances of borning of ITO film.

(3). The ideal method to clean the ITO substrates, you had better to use a detergent such as DECOM90 or other detergents. Firstly, you need to use de-ionised water to dilute the detergent e.g. 1:4 ratio of detergent to DI water. Then put your substrates on a holder dipping into the mixture of the detergent solution. After that, put the container with solution and substrates into a ultrasonic bath for cleaning in the duration of 30 mins. Then, wash the ITO substrates with DI water. Dry the substrates with a Nitrogen blower. Then you could put the substrates into a plasma Asher to have a treatment.

Hope this information may help you.