We are using pure tungsten electrodes in a plasma focus device. Thanks to our RG colleagues we removed the oxides from our tungsten electrode, but the oxides came back after our first shot. The source of oxygen was clearly the stainless steel 304 vacuum chamber. We can’t bake the chamber at high temperature as our device requires Mylar insulation which can’t withstand temperature much above 120 C. Running H or H-N plasma at low temperature (70 C) did not work in removing the oxides either. So we are looking to coat the chamber with some material that will not give up oxygen even when (very briefly) exposed to plasma at high temperature. We operate with a N-D mix at a total pressure of around 10 torr.