I want to grow oxide thin film. which technique can be the best one.
please help me
I strongly believe that the best method will be to expose the material to oxygen
Hi Shalu Pathak,
Magnetron Sputtering and Pulsed Laser Deposition methods are the most popular and easy, and other methods are MOCVD, Sol-gel, MBE etc.,
Regards
Kesava
I strongly believe that the best method will be to expose the material to oxygen
Dear Pathak,
There are various methods to grow oxide materials.
As you are saying growth, I assume that the material must be synthesized as thin film. Therefore, skipping synthesizing nano-particles through sol gel, citrate gel method etc. However, nano-particles can also be synthsized and coated as thin film (via master-blade, spin coating methods).
Direct thin film growth of oxide materials via three popular methods
- Vacuum based methods, (PLD, ALD, Sputter, Thermal Oxidation etc): For this, find the phase diagram (Partial pressure of O2 and Temperature diagram) of the metal and oxygen for the desired oxide material.
- Solution Processing: Find suitable precursors
- Electrodeposition: Find the Pourbaix diagram (pH-Potential window)
As your question is not for any specific material, this is how I tried my best to answer. Indeed, there are many parameters to be considered for growth of oxide materials.
For e.g. Pourbaix diagram will simply say about the pH and potential for electrodeposition of a material. In practical, we need binder, complexing agents, additives, temperature for desired orientation, film morphology etc.
The following book may be useful for you.
Thin-Film Deposition by Donald L Smith
You can use laser molecular beam epitaxy (LMBE) technique combined with reflection of high energy electron diffraction (RHEED) to in-situ monitor the film growth thickness which can be down to even one monolayer.
RF sputtering of the oxide is the most direct method, although somewhat slow, but good for thinner layers.
Dear S. Pathak,
Best technique among the various aforementioned techniques, could be decided with consideration of a) required evaporation temperature of the growing material, b) uniformity (in terms of thickness and roughness), c) flux rate, d) allowance of contamination of chamber etc.
Generally, MBE method is the most delegate method for preparing thin films with uniform (in terms of roughness) and good crystalline quality.
With regards,
Anjan
Dear Pathak, I do agree with the Anjan's recommendation. Among all the available techniques, It depends on your application of oxide film e.g. if you want tho grow gate oxide for MOS devices then MBE would be the best suited method. So, figure out your application and then go for the method to grow oxide films.
I prefer Sputtering technique it is a bit slow but with low roughness...
There are various process. All of them have certain advantages/ disadvantages. Which process will be suitable for you that depends on the purpose of the oxide material fabrication.
Dear Dr. Ghosh,
You are right. I said the samething. Whatever the process may be, thermodynamic conditions must be met. If want to know more, please refer to my publication: Reduction of Iron Ore by Hydrogen Plasma: Overview. Enjoy research & Cheers....Dr. Sabat
There are many methods for ZnO thin film growth such as
(i) Vacuum based methods, (PLD, ALD, sputtering, thermal Oxidation, MBE, MOCVD, thermal evaporation, magnetron sputtering, etc):
(ii) Sol gel solution method: Spin coating, spray pyrolysis method are the best economic and environmentally friendly methods.
(iii) Solution Processing: Chemical bath deposition method, deep coating method, electrodeposition etc.
Hi, depending on your application and substrate material anodisation can also be an option. Hard non-porous oxides can be easily created with the appropriate wet chemistry. Oxide thickness is determined by the applied voltage. Another method is the thermal sublimation of silicon monoxide under moderate vacuum conditions.
I have used both methods and obtained good results.
Best regards,
Martin
There are many methods as mentioned above but every method have specific conditions so it depends upon the material/oxides for what you want to make film. So its better to read some literature on your material then decide which could be more effective.
I believe, PLD in the oxygen ambient will be the easiest way to get oxide thin film.
best of luck
Aslam
There are some different methods for this purpose. For instance: Laser vapor deposition, Laser chemical vapor deposition, sputtering and etc. There is also a novel technique called LIFT (Laser-induced forward transfer) which is much faster than the other techniques, mask-less and no vacuum is required.
I have seen reactive sputtering used to do this type of work but I there are many ways to do this
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