10 October 2018 0 9K Report

I am currently working with a Ultratech Savannah S100 ALD system. Currently, the system can be pumped down to a base pressure of 80 mTorr. Obviously, there is some room for improvement. But I am wondering if this is an acceptable base pressure for Al2O3 ALD deposition. The precursors are H2O and TMA (trimethylaluminum). Thank you

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