I am working on Si thin film solar cells. I got voc of near 500 mV and Isc of about 25 mA/cm2 but with the fill factor of about 19 % only. Aluminum was base electrode and TCO was the front electrode. Surface roughness was the order of 85 nm with some porous film structure. The thickness of the device was 20 micron with the thickness of both the electrodes are about 100 nm.