Currently I am working on some new organic molecules and I am getting the 3D island morphology.

My deposition conditions are as written below. 

Substrate: Silicion with thermally grown SiO2

Cleaning. acetone , ethanol. pure water, OZ treatment.

Organic molecules deposition.   Rate; 2A/1min.  Subtrate temp Room temp-60C.

I checked the morphology by AFM images

My target is to get the 2D amorphous morphology. 

I changed temp from RT- 60degre  but still same morphology. 

What are the other possible things I need to do?

More Mir Waqas Alam's questions See All
Similar questions and discussions