Focused ion beam (FIB) devices can generate beams with a diameter (FWHM) of less than 10 nm. What are the methods for measuring diameter of Focused ion beam (FIB)?
I am rather familiar with early methods like measurement the width of a sputter- etched on gold film and observing the chemically etched pattern of implant damage in the substrate. The line widths of such etched patterns correlate to beam diameter. By those method it’s impossible to measure the beam size during the implantation processes.
Knife edge method is the other method which has been used to measure FIB diameters. The main idea of this method is detecting signal-intensity variation in FIB scanning through the use of a sharp edge.
One of the common method is to expose the substrate after coating it with a PMMA resist. The developed resist pattern reflects the shape of the beam.