Can any one suggest me is it possible to make 10 nm Titanium nitride thinfilm into nano particles or nano islands using annealing process at lower temperature or please suggest me any route to do this process ?
You could consider this technique
Article Production of nanopowders from physical vapor deposited film...
I hope you make a feedback to me with your results
Best wishes
The link below help
Chapter Fabrication of Plasmonic Crystalline Thin Film of Titanium N...
Dearest Poshan kumar reddy Kuppam
several types of TiN samples for comparison were provided by courtesy of Mr. Akitaka Kashihara (Shinko Seiki). The samples were made by RF sputtering based on Ar/N2 plasma, Ti target, and substrate (GS: S2112 glass slide, Matsunami Glass). Three samples of (a) TiN (50 nm)/GS, (b) SiO2(150 nm)/TiN (50 nm)/GS, and (c) TiN (200 nm)/SiO2 (150 nm)/TiN (50 nm)/GS were produced experimentally with a view to asymmetric MIM structures. The thickness or duration of sputtering was calibrated with other samples.
And (d) a disparate TiN(50 nm)/QZ (Quartz) sample was also given by courtesy of Mr. Kaoru Hoshino (Parker S⋅N Kogyo). A quartz substrate covered with vacuum evaporated Ti thin film (50 nm) was treated by nitriding process with high temperature nitrogen gas (800°C, 1 hour), which is commonly applied to protection coating of industrial tools.
the link below may can help you more
Chapter Fabrication of Plasmonic Crystalline Thin Film of Titanium N...
yours
Ruaa A.Mohammed
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