Hello!
I want to do a deposition of a self-assembled monolayer (alkyl silane) on a silicon wafer. I was thinking of something like a C18 or C16 trimethoxy silane. Will this work with simple vapor phase deposition? What vacuum level is needed for the desiccator? Will a 1%/5%/10% solution in toluene work well? Is there a different SAM that will be easier to do?
Thanks!
If you aim for a monolayer, the use of monofunctional silanes might be preferable, such as https://www.sigmaaldrich.com/catalog/product/aldrich/375977?
Trimethoxysilanes tend to form polymeric layers.
Thanks for the recommendation Michael G. Weller! What process would you recommend for the deposition?
A 1% solution in toluene over night should be fine. Cleaning of the surface is crucial.
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