please guide me. what is the Best conditions  Laboratory such as different temperatures, different pressures , defferent gas ( for example Ar or N2 or O2 or The ratio of a mixture of them ) and time needed to do deposition for compact tablet the Tio2 layer in the RF Sputtering method on glass ITO or FTO or TCO?

The thickness of the Tio2 layer is a few nanometers, is it better?

best regarded

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