10 November 2018 3 8K Report

I am trying to deposit WO3 films on a glass substrate. My precursor is BTBMW and H2O. The tungsten precursor is vaporized in a nebulizer. For some reason, a powder/film is forming on my reactorhead instead of my substrate. The separation distance between the reactor head and the substrate is about 100um. Lowering the temperature of the stage doesn't seem to have an effect.

Any suggestions?

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