Lattice matched single crystal substrates result in the epitaxial growth of materials. This is due to the less strain in the crystal, thereby exhibiting the material in a low energy state. On the contrary, the polycrystalline substrates lead to the random growth of the material.

What are the main reasons behind the non-epitaxial growth of the material on a polycrystalline and no lattice-matched substrate? How the nucleation and growth proceed on such substrates. I am only considering the substrate effect (nucleating sites) and not the other deposition parameters.

Thanks.

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