I'm giving a presentation on semiconductors and specifically the SiO2 insulating layer. The presentation is on kinetics so I kind of need to know the reaction. Problem is the papers I'm reading (Deposition of Silicon oxide, silicon nitride and silicon carbide thin films by pevcd & remote ap-pecvd of silicon dioxide films from HMDSO) don't go into it. Does anyone know the reaction? What bonds are breaking in HDMSO and the side product/by product?
Dear Dr. Sean Schulte,
the chemical reaction is quite complex, I suggest you to have a look at the following papers:
- The role of oxygen and surface reactions in thedeposition of silicon oxide like films from HMDSOat atmospheric pressure
R. Reuter, K. Rugner, D. Ellerweg, T. de los Arcos, A. von Keudell, J. Benedikt
physics.plasm-ph (2011)
Available at: https://arxiv.org/pdf/1105.5899.pdf
-Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
Katja Rügner, Rüdiger Reuter, Dirk Ellerweg, Teresa de los Arcos, Achim von Keudell, Jan Benedikt
In Plasma Process and Polymers, Volume10, Issue12, Pages 1061-1073 (2013)
Available at: https://onlinelibrary.wiley.com/doi/abs/10.1002/ppap.201300059
Best regards, Pierluigi Traverso
This book help you
https://books.google.dz/books?id=FbrwCAAAQBAJ&pg=PA237&lpg=PA237&dq=Reaction+of+hexamethyldisiloxane+(HDMSO)%2BO2%3DSiO2%2B?&source=bl&ots=NeblmZdGwk&sig=ACfU3U3amPXVNrZt78zwPhpFqs0hKzM9iQ&hl=fr&sa=X&ved=2ahUKEwi1xZHYodXpAhUSuqQKHbaPBwEQ6AEwB3oECAYQAQ#v=onepage&q=Reaction%20of%20hexamethyldisiloxane%20(HDMSO)%2BO2%3DSiO2%2B%3F&f=false
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