22 April 2018 1 2K Report

I want to maintain SiO2 wafer's OH layer.

So, after oxidation on the quartz wafer surface, i put it in the oven(60 ℃ ) for 12 hours, and then cooling it at room temperature for using it.

But 12 hours activation just be selected by my think.

So i want to know how long can it be stored to maintain oxidation thickness?

please help me..

More Jimmy Jo's questions See All
Similar questions and discussions