Is it possible to convert p-type conductivity to n-type conductivity of copper oxide during the vacuum deposition process?
yes, it is possible by metal doping method
read this paper for a detailed procedure
DOI: 10.1016/j.apsusc.2017.12.004
Thank you for the update @ Athique Ahmed but I am searching for physical vapor deposition proces but not chemical process. The paper what you have shared is chemical process.
If you want PVD, consider reactive sputtering, so use a Co-doped Cu target assuming you find a provider selling that and sputter with and Ar/O2 plasma. Please be aware, however, that electronic grade materials are very hard to achieve in sputtering [not impossible, though], but I mean, there's no guarantee that science works out in the intended way.
What about taking n-type copper oxide as source material and directly deposit using an E-beam instead of Sputtering?
Vadim S. Gorshkov
thank you for the information. Actually, in literature the copper oxide (either Cu2O or CuO) is always a p-type but in my case the the undoped copper oxide film which i deposit using E-beam evaporation is forming n-type nature measured using hall effect.
Vadim S. Gorshkov
Thank You for answering my query. Yes, I am doing the same process you have mentioned. I take Cu2O n-type as a source and deposited it. Further, anneal the films but still getting the n-type conductivity.- Badges
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