Hi. I'm doing an intercalation of Antiferromagnetic material using electrochemical reaction. But I just figured out after all experiment done, most crystals exfoliated on the substrate was gone. Guess crystal and the substrates' adhesion is not good enough even though I did annealing(180C for half hour) after exfoliation. So I would like to use a substrate which is magnetic and also conducing but would not be involved in the electrochemical reaction. I can may coat some material on the Si using e-beam but which material should i use? I first thought Co but it's not stable at all.. it will be intercalated instead.