Normally tantalum has high affinity to react with oxygen and forms Ta2o5 . but we want to sputtered oxide free tantalum. is there any way to deposit oxide free tantalum or is there any Ta alloy which can not react with oxygen when we deposit as a thinfilm by sputtereing or evaporator?
for example copper also reacts with oxygen very easily but its alloys like manganin and constantan wont react with oxygen easily, like as said can we have any Ta alloy which wont react with oxygen?
You are mixing two different things: oxidation of an element of the alloy and resulting composition of the oxide layer on the alloy surface.
Tantalum oxidizes whether its concentration in the alloy is 100% or 1%. This is its property as a chemical element. In this sense there is no tantalum alloy that does not oxidize.
Another thing is the composition, structure and thickness of an oxide layer growing on a certain alloy. For example, an alloy containing 99% platinum and 1% tantalum can be considered to be practically oxide-free because the proportion of tantalum oxide on the surface is very small.
Different situation is with tantalum containing alloy with elements that are more active than tantalum. For example, alloys from the Al-Ta system (amount of Al greater than the amount of tantalum) will form an oxide layer of pure Al2O3 on the surface, because aluminum oxidizes first and prevents tantalum from oxidizing.
You will not find pure titanium metal that does not oxidize at room temperature, just if you get an alloy with a high titanium content
@Bobby Bnm, Yes, it is possible to deposit oxide-free tantalum or use tantalum alloys that are less reactive with oxygen during the sputtering or evaporation process.
Oxide-Free Tantalum Deposition: To achieve oxide-free tantalum deposition, you need to ensure that the sputtering or evaporation process takes place in a high-vacuum environment. By controlling the deposition parameters and minimizing exposure to oxygen, you can reduce the likelihood of oxide formation on the tantalum thin film. This requires using specialized equipment and techniques to maintain a controlled atmosphere during the deposition process.
The evidence supporting the justification for oxide-free tantalum deposition and the use of tantalum alloys to reduce reactivity with oxygen comes from various studies and research in the field of materials science and thin-film deposition.
https://shorturl.at/blsQ5.
These studies typically involve experimental techniques, such as sputtering, evaporation, and other thin-film deposition methods, under controlled environments
Tantalum Alloys: Tantalum alloys can be engineered to be less reactive with oxygen compared to pure tantalum. One example is the use of tantalum alloys with noble metals like platinum (Pt) or gold (Au). These alloys can exhibit improved oxidation resistance and enhanced stability under certain conditions. By carefully selecting the composition of the alloy, it is possible to reduce the reactivity of tantalum with oxygen during the thin-film deposition process.
When dealing with sensitive thin-film depositions, it is crucial to work in controlled environments, such as high-vacuum systems or inert gas atmospheres, to minimize exposure to reactive gases like oxygen. Additionally, choosing the right tantalum alloy can significantly influence the oxidation behavior of the deposited thin film. https://shorturl.at/iqtHU
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