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Questions related from Bobby Hk
I am using BCl3 etching for III-V semiconductor material by using Photoresist as a masking layer. I want to etch 100nm of III-N material . can it be fine if I use Photoresist as a masking layer...
25 February 2025 3,228 0 View
We are measuring GV response of MOSCAP by B1500 Semiconductor Device Analyzer. We notice that at high frequency we see negative conductance behavior. Can anyone help how to solve this problem or...
19 April 2024 2,358 3 View
Can I use standard cleaning procedures such as RCA1,RCA 2 and Piranha for GaAs substrates ? or these recipes can create any surface morphology by etching the wafers?
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We want to etch (dry or wet etching) of InGaP . Can anyone suggest me the recipe for this ?
26 November 2023 2,341 0 View
In photolithography normally we see 1um or 2 um accuracy , how can we calculate this?
20 November 2023 996 2 View
We are electro spinning nanofibers on ITO coated PET sheet. When we want to keep (deposition by evaporation or sputter)top metal on nanofibers it is shorting with bottom metal(ITO metal). Is there...
16 August 2023 2,579 2 View
Normally tantalum has high affinity to react with oxygen and forms Ta2o5 . but we want to sputtered oxide free tantalum. is there any way to deposit oxide free tantalum or is there any Ta alloy...
04 July 2023 4,052 3 View
is there any affect of cleanroom conditions specifically humidity on the photolithography process, such as feature size, developing time ,resolution ..etc?
15 October 2022 5,146 7 View
I am using interdigitated Electrode system in sensing. If I increase the number of fingers in IDE system ,what will happen to equivalent Resistance?
12 July 2022 6,224 0 View
