Dear Srinivasarao Bukkuru ,

Glancing angle deposition can be performed using different techniques, and they have a profound influence on the film growth. In thermal evaporation, the typical kinetic energy of the deposited atoms is below 0.1 eV, whereas in sputtering it can reach a few tens eV. Besides, in sputtering there are ballistic atoms but also thermalized ones: the atoms that have collided with ions in the plasma and have gradually lost their initial kinetic energy and preferential direction before being deposited.

As you work in the Institute for Plasma Research, I guess Glancing angle deposition with sputtering may be of particular interest for you, so I suggest reading these works:

Article Growth regimes of porous gold thin films deposited by magnet...

Article On the Deposition Rates of Magnetron Sputtered Thin Films at...

Article Nanostructured Ti thin films by magnetron sputtering at oblique angles

Article Kinetic energy-induced growth regimes of nanocolumnar Ti thi...

Moreover, there is a free Monte Carlo program from Ghent University that simulates the transport of sputtered atoms through the gas phase:

https://www.ugent.be/we/solidstatesciences/draft/en/services/software

Good luck with your research!

Thank you Dr Jose-Miguel Garcia-Martin. Earlier I saw a few papers you mentioned. I shall go through all these in detail. I also referred to one paper with Dr Rafael Alvarez and your other co-authors in my recent paper that is linked above. Thanks for suggesting the Monte Carlo program from Ghent University.

Thanks and regards

Srinivas

NASCAM is not an open source, but it is free - 3D kinetic Monte Carlo package to simulate film growth - https://www.unamur.be/sciences/physique/ur/larn/logiciels/nascam Using this code you cn simulate balistic deposition with or without taking into account surface diffusion