Is there any damage to Photoresist mask (S1813) in BCl3 dry etching process?

25 February 2025 0 3K Report

I am using BCl3 etching for III-V semiconductor material by using Photoresist as a masking layer. I want to etch 100nm of III-N material . can it be fine if I use Photoresist as a masking layer for this etching?

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