Hello everyone
I am doing FeNi plating on glass slide through photoresist mask. I do it in a beaker with 3d printed anode and cathode holders. It works well but the process can take more than 9 hours. I was wondering if it is possible to do the plating on two substrates at the same time to increase the throughput.
Is it possible to put two substrates in the same beaker ? Should I connect them in series or in parallel ? I don't know if it is recommended.
Is it possible to have two beakers, connected in series from the same DC current generator so that the current density is the same in both beakers ? Is that recommended ?
If someone have already tried to do that, I would be interested.
Otherwise, I will have to get a second generator and make a second complete setup.
Many thanks
Simon