If I want to deposit silica or GeO2 doped silica by sputtering deposition technique how much thickness control I can achieve ? Is it possible to achieve sub nano-meter thickness control in sputtering ? If not then which deposition process is suitable to achieve sub nano-meter control in thickness in the deposition of silica ? It will be helpful if someone can provide me any references related to this.
What is the diameter of silica molecule? A calculation here would be enlightening...
well a silica molecule size can sub nanometer sized,, but extracting a single silica molecule, or spreading a monolayer is definitely challenging, and probably ALD can handle the deposition, but one should check the literature. Colloidal silica particle can range from 1 to 5 nm, and looking at the challenge ALD seems to be more promising, in comparison to sputtering, because it is difficult to control the deposition and obtain a uniform coverage with monolayer coverage.
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