I need to anisotropically etch 5um-wide, 100um deep holes into PDMS films. Has the Bosch process ever been successfully applied to PDMS? I found no published articles on the topic.
Please note: Mold replication is not a possible in my application, I need to directly etch the silicone film.
Dear Marco Scandurra,
I don't think DIRE would work for your case. The only option is to use the laser ablation technique.
You can do RIE of PDMS:
http://jungleboogie.org/75CF4_25O2_rie_etch_pdms.pdf
whether this technique can be adapted for Bosch, I don’t know.
James, Thank you. The Bosch process requires deposition of a fluoropolymer which might not adhere to PDMS. I think that is the challenge. I was hoping someone tried it and could share their experience even if unsuccessful.
Xuhua, Thanks. It might be possible with a femtosecond laser and precisely tuned optics and pulse shape, but this is something I do not have available. Instead I have a DRIE machine in my lab.
The perflourocyclobutane step. Poor adhesion might be a problem.
what if you used one of the fluorosilicones? I think they mix in some Si with 1 CH3 and 1 3,3,3-trifluoropropyl - can be 100% or mixed with the dimethyl Si. That would enhance Compatibility and adhesion of the fluoropolymer.
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