I need a NanoImprint (NIL) stamp master from a US company. I have an NSF grant and can only buy from US companies. I need a CD (critical dimension) of 50 nm, so I would assume it would have to be made with electron beam lithography. Any suggestions of companies are welcomed. Attached are two drawings of what I need; one drawing of the cross-section view and one of the top-down view.
Hi Taylor,
Are you looking for the hard quartz masks used in Canon Nanotechnologies step and flash?
Or trenches in a silicon wafer so you can generate your own soft imprint masks?
Anyway, Toppan photomasks in USA might be able to help you out here. Also the federally funded nanotechnology centers (such as Brookhaven, UT Austin) might be able to sell/provide this service.
Just some ideas, good luck.
Dustin W. Janes thanks for the input. I am very new to NiL so I don’t really know. I assume I need the latter and that I would just need a master to cast things like PMS and Omor stamp. Are 50 nm features attainable with that type of Material stamp? If you can, tell me the difference between the two you mentioned ?
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