I have sputtered Ti Film on a gglass substrate i want this film to convert in TiO2 , Can i do it by simply putting this in over or furnase ?? reason currently not having oxygen cylinder and I need tio2 film ...
I believe it may be difficult to control both the thickness and composition of TiO2 in a furnace anneal. In CVD mechanism, you must optimize the temp, gaseous composition, flow rates of O gas, sometimes H2O gas is also used for optimum conditions of oxidation. It is best if a Ti precursor and H2O are made to react on the substrate, that will enable higher control.
Ref: Article Chemical vapor deposition of TiO2 thin films from a new halo...
Mechanism of oxidation of deeper Ti layers varies stoichiometrically where it is difficult to obtain an x=2 (in TiOx) in a furnace anneal. Obviously, film contamination is a major issue with furnace oxidation. You may want to check out the article below :
Article Oxidation process in titanium thin films
This is not a very good technique for TiO2 film preparation. Because the anatase and rutile phases of TiO2 very often coexist and you cannot vary the temperature arbitrarily because of your glass-substrate. Anyway, for < 100 nm Ti-film, open air annealing would give you TiO2, but don't expect very high quality films.
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