Silica has been deposited on Si by R F Magnetron sputtering. Upon exposure of these deposited films to the ambient atmosphere, some hydroxyl groups may get bonded to the silica network due to the moisture present in air. So, how can I find out how much hydroxide has formed on the surface of silica by quantitative FTIR analysis?
Presence of hydroxyl groups may effect the water contact angle of the deposited films. This needs to be studied.
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