Barrier has been removed from porous alumina
method of deposition is chronoamperometric
Are you preferring chemical / solution deposition? If yes then you should consider avoiding TEA, hydrazine hydrate.
Also you should consider the substrate surface interaction with the CdTe nuclei..
Firstly, you must determine the method that used in purpose. If solution deposition? then you should use less dense of solution.
And if electrodeposition or electrochemical or other? then the deposition rate do not be high to avoid the interaction among particles.
Can you show pictures? What are you doing exactly? You are trying to grow rods by electrodeposition inside porous alumina, on one side of which you have your cathode and the other side of it is exposed to the solution?
Maybe you have grown too much, and you have grown rods inside the alumina but now they are full and the growth process has continued isotropically outside the alumina? In that case you can try to pass less charge (lower current or shorter time).
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