After removing my PDMS device from my silicon master, it shattered and left silicon fragments within the features of the device. I have tried using scotch tape to remove them and also washed it in an ultrasonic bath with both 70% ethanol and again with water and detergent. However, there still seem to be a few fragments under the microscope.
Dear Joshua,
welcome,
My proposal is, If you want to remove silicon shards from your PMDS object you can use the so called selective etching where you find an etching solution to react only with silicon and dissolve it. You may use a mixer of nitric acid, hydroflouric and atcetic acid. These solutions are used for polishing silicon. You may use sodium hydroxide. You may investigate your self if the PMDS is resistant against these etching solutions.
Best wishes
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