I have an on-chip photopolymerization system where a flood uv source is used to induce free-radical reaction in fluidic channels. To pattern the light on the designated areas on the chip, a chrome-glass photomask is placed on top of the chip. However, when I turn on the uv source, the glass photomask heats up rapidly and leads to the heating of the chip, which causes fluids disturbance. Therefore, I am wondering if there are good methods, preferably some coating strategies or different kinds of photomasks that I can use to prevent heating?

Thanks in advance.

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