A sputter-deposited metal thin film (~30 nm) may be partially crystalline and partially amorphous. Peaks are easily identifiable from the diffractogram, but it may be hard to identify the amorphous % from the diffractogram as the background is relatively flat. In this case, what can be done to tell the % crystallinity of the thin film?
If the background is flat, you may simply have a highly crystalline film.
Can you grown on a crystalline substrate so it would be easier to pick up that background?
Try to measure in asymmetric grazing incidence geometry, and vary the incidence angle (i.e. penetration/information depth) systematically. Thereby, the amorphous content should be enhanced if it is really present in the film. But just one comment: Prue metal films are usually polycrystalline - amorphous monoelemental films are usually metastable and only present at low temperatures. Kind regards, Dirk
Using X-ray diffraction you can determined the crystallinity of the thin film material from measurement the intensity of the highest crystalline phase formed and the lowest peak then determined the % crystallinity and % amorphous using simplest mathematical equation.
Dear Dr. Kan Fu
have a nice day and good times
Please attach the XRD pattern to could give you a definite answer.
The attached papers may help you in your study..
Good luck
https://www.researchgate.net/publication/277004252_Microstructure_and_crystal_imperfections_of_nanosized_CdS_x_Se_1-x_thermally_evaporated_thin_films?ev=prf_pub
https://www.researchgate.net/publication/277010463_Crystal_imperfections_and_Mott_parameters_of_sprayed_nanostructure_IrO2_thin_films?ev=prf_pub
Article Microstructure and crystal imperfections of nanosized CdS x ...
Article Crystal imperfections and Mott parameters of sprayed nanostr...
Dear Dr. Kan Fu
Have a nice times and good day
There are many parameters control the physical properties of the nano-crystalline films like:
1-The deposition rate or the spin coating speed.
2- The substrate temperature or the deposition temperature.
3- The film thickness.
The decreasing the deposition rate and increasing of both the substrate temperature and the film thickness lead to increase the crystallization process. Increasing the crystallinity leads to the improving of the structure and electrical properties of films. As well as, the annealing of the substrate to higher temperature and the film samples also lead to the same results.
good luck
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