Hi Muhammad Usman

Thin films are to be prepared/fabricated using the photocatalyst you have synthesized. There are many methods reported in the literature that can be used to make working photoelectrodes.

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1. Chemical Vapor Deposition (CVD): precursor gases are introduced into a reaction chamber, where they react and deposit as a thin film onto a heated substrate. This method allows for precise control of film thickness and composition.

2. Physical Vapor Deposition (PVD): PVD techniques include methods like sputtering and evaporation. In sputtering, ions or atoms are ejected from a target material and deposited onto a substrate. Evaporation involves heating a source material until it vaporizes, and the vapor is then condensed onto a substrate.

3. Sol-Gel Method: The sol-gel method involves the preparation of a sol (a colloidal suspension of nanoparticles) from a precursor solution, followed by gelation and drying to form a thin film. This method is particularly useful for depositing oxide-based thin films.

4. Spin Coating: Spin coating is a simple and cost-effective method. A solution containing the semiconductor material is applied onto a substrate, which is then spun at high speeds to spread the solution evenly. After drying, a thin film remains on the substrate.

5. Electrodeposition: Electrodeposition involves the electrochemical deposition of a thin film onto a conductive substrate. It offers good control over film thickness and can be used for materials that are difficult to deposit by other methods.

6. Chemical Bath Deposition (CBD): CBD is a low-cost method that relies on the chemical reaction of precursors in a bath solution to deposit thin films. It's commonly used for thin-film deposition of materials like CdS and CdTe.

7. Atomic Layer Deposition (ALD): ALD is a precise and conformal thin-film deposition technique that involves cyclic reactions of gaseous precursors. It is suitable for depositing ultra-thin films with precise control over thickness and composition.

8. Spray Pyrolysis: In this method, a precursor solution is atomized and sprayed onto a heated substrate. The solvent evaporates, leaving behind a thin film of the desired material.

9. Laser Ablation: Laser ablation involves using a high-energy laser to ablate a target material, generating a plume of vaporized material that condenses onto a substrate, forming a thin film.

10. Chemical Solution Deposition (CSD): coating a substrate with a solution containing the desired material and then thermally or chemically treating it to form a thin film.

The semiconductor film (photocatalyst) should be properly adherent to the transparent conductive surface(TCO i.e., FTO in your case). If the layer is not peeling off during testing, you can perform the tests whatever you have mentioned in your question.

Hope this helps your work