Hello,
I am trying to assess the porosity/density of silicon oxides coated substrates. (depositied by PECVD)
In order to do that i want to use the X Ray Reflectivity method.
Two of the most difficults obstacles with my samples are that the coating is not as smooth as required for XRR and that the samples are curved. (due to the process used to deposit the coatings).
Is there anyway to overcome those issues and colelct some valuable reflectivity spectra on my samples? (e.g. different ways to mount the samples, changing the acquisition parameters..etc..)
Thanks