there's no problem to measure the nano-scale film thickness on Si substrate
But when the film was deposited on sapphire (single-side polished)
the intensity become weak and the data was scattered
the possible reason is that the back side reflection affect the measurement
Is there any way to solve this?
Dear Huan-yu,
Spectral reflectance measures the amount of light reflected from a thin film over a range of wavelengths, with the incident light at a known angle to the sample surface. Ellipsometry is similar, except that it measures reflectance at non-normal incidence and at two different polarisations.
I understand that generally, spectral reflectance is much simpler and less expensive than ellipsometry. Would you consider the use of a reflectance UV/Visible spectrophotometer.
Please see the attached document, which may be of use to you.
Kind regards,
Ade Kujore
Marketing
Cecil Instruments Limited
Milton Technical Centre, Cambridge CB24 6AZ
United Kingdom
email:- [email protected]
telephone:- +44 (0) 1223 420821
fax.:- +44 (0) 1223 420475
web site:- www.cecilinstruments.com
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