I am working on pH measurement system-on-chip. Manufacturing of this sensor on-chip requires CMOS compatible materials to use. I wonder if Iridium, Ruthenium are CMOS compatible?
I have been looking into MSDS of KOH of 0.1 M, and it says use proper ventilation area while working. But in my lab, we don't have fume hood to work with. And I am not able to find any safety...
11 December 2019 1,936 3 View
03 December 2019 8,975 3 View
I am measuring OCP between working and reference electrode. As referance electrode I am using Pt-H2 electrode. As a working electrode, I am using platinum electrode. Referance electrode is filled...
10 November 2019 8,606 3 View
I have been getting a low plasma and no coating while doing rf sputtering of copper doped ZnS using a power of 140 watts and at pressure of 6.5x10-3 Mb.
07 August 2024 4,526 4 View
I am experiencing this for the Bi2Se3 sputtering target. Initially, even if the target was 2:3 in Bi : Se, with a few sputtering runs, due to the high escaping tendency of selenium, the top layer...
23 July 2024 1,649 1 View
Hello I want to know about the sputtering condition of depositing FTO from target 95:5%. I tried with RF sputter in pressure 2.5Pa and 100 sccm Ar at room temperature but it showing no...
21 July 2024 1,680 2 View
We are fabricating a tandem structure where a ~50 nm thick WO3 film is deposited between two metal films using DC sputtering. We use a mixture of Ar and O2 gases at different flow rates while...
01 July 2024 2,686 2 View
I am fabricating the Hall bar (5 micron width and 35 micron length) of Ta(3nm)Co(4nm)Pt(5nm) using photolithoghaphy and sputtering. This Hall bar is connected by contact pads of Ti(10nm)/Au(60nm)...
29 June 2024 2,079 3 View
Dear Sir, Four publications in my profile do not belongs to me belongs to MALLAMMA, University of Mysore , Mysore: They are 1. Kinetic and Mechanistics studies of Pd(II)...
29 June 2024 1,732 0 View
Basically CMOS are used for designing the SRAM cells . How the functionality will differ if we use Multi threshold CMOS instead of CMOS generally MTcmos decrease the leakage power but it will...
28 June 2024 9,845 0 View
Using magnetron sputtering with an alloy target composed of A:B:C in a 2:1:1 ratio, the resulting thin film composition is A:B:C=1:1:1. How can you achieve a A:B:C=2:1:1 composition? What are some...
24 June 2024 1,605 0 View
Suggest some procedure where i can synthesize [Ru(p-cymene)Cl2]2 in a good yield.
23 June 2024 9,244 2 View
We have observed many holes on the surface of TiO2. These holes have a diameter of approximately 1 µm and a depth of about 30 nm. The formation of these holes is mainly related to the...
20 June 2024 3,861 1 View