How to get a thin film of vanadium penoxide with less than 10 nm in thickness on metal surface?
You can use PLD and controlling the ablation time, distance, temperature you can vary the thickness of the film, you can have a look over this paper and in this website you will get some other publications,
http://web.khu.ac.kr/~mdpld/publications/85.pdf
http://web.khu.ac.kr/~mdpld/facilities_4.htm
Dear prof. Meng Hu,
spattering preferred for this purpose.
Best regards
I think ultrathin film formation can be perform by following techniques:
· Metal deposition techniques, such as vacuum evaporation and sputtering, have been well established and are cost effective. The dry process also eliminates the risk of contamination.
· Simple multi-layer deposition, for which each layer is passivated. This method is highly effective in suppressing the ripening effect
10 nm is the critical thickness for whatever deposition method you choose: deposition time does become so short that a consistent, repeatable deposition can hardly be guaranteed.
With very, very scrupulous control of all deposition parameters you might be able to achieve 5 nm uniform, repeatable thickness, But emphasis is on "might".
Maybe another idea helps you. A common idea is to deposit a more thick layer of plating and the next step is to etch it by the chemical way until thickness you need.
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