You can dissolve silicon by using wet chemical etching. The etching solution is a mixture of nitric acid NHO3 and hydroflouric acid HF. The mixing ratio must be adjusted to affect isotropic etching. For the proper mixing ration and condition of etching please refer to the link:http://www.microchemicals.eu/technical_information/silicon_etching.pdf
You have to take care of protect your film from etching if it is not etching resistant against the etching solution. SiN3 is aa very good masking material against this silicon etching solution.