Assalam Abbas,
You can make use of Laser-Induced Plasma (LIP) for this purpose. The method is known as PLD (Pulsed Laser Deposition).
You ablate the target with a pulsed laser and place substrate in front of it. In this way, the target material ablated in the form of plasma deposits on the substrate as a film, thickness and smoothness of which can be modify in several ways.
I hope it would be helpful.
Best wishes.
Assalam alikom ya Zuhaib ,
Thanks.my meaning How to create plasma conditions?
All the best.
What kind of plasma? Is it for deposition or for surface cleaning?
Plasma should be such as to avoid sputtering of the substrate and obtain a dense and adherent deposit. Normally the pressure is less than the atmospheric pressure and only a small fraction of the gas is ionized to control the deposition conditions. It can be either dc plasma or inductive plasma. The voltages are controlled to obtain a good/desired deposition conditions. Any good book on thin film and coatings can provide you with a great deal of useful information.
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