I am trying to get the absorbance of TiO2 thin film applying Kubelka- Munk function to the reflectance spectrum however reflectance of Si is high in the UV-VIS region of spectra(200-500nm) and substrate is always thicker than the film(the thickness of the films are ~0.5-1.5 um).
So, may you please recommend a paper/textbook in which this issue was solved? Is it possible to separate the reflectance of the film from the substrate in this case or it is better to use another substrate?
TiO2 sols have a strong absorption in the UV region 200-300nm. Sergeev A. M. film deposited on a quartz substrate. To get more information about the substance A. M. shot fluorescence spectra.
Thanks, Elena. Anatol'evna!
We also use quartz as a substrate for depositing TiO2 films. Quartz is a suitable substrate for obtaining absorbance of the TiO2 films from the transmittance measurements using Beer's law(but there is still an issue concerned with the interference). However we also need to use other substrates and some of them, like Si, is opaque in the UV-VIS region of spectrum. So, there must be an approach to distinguish the spectrum of the film from the spectrum of the substrate(there are such approaches used in XRD and XPS). Currently I just subtract the spectrum of the substrate from the spectrum of film+substrate, multiplying the spectrum of the substrate by some arbitrary coefficient. However, it does not seem working well.
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