Hello! A colleague recently used a photomask for standard negative photolithography and some liquid photoresist solidified on the mask. Does anybody have recommended cleaning techniques? Would you advocate for/against piranha cleaning of a sodalime substrate/chrome?
For both new and recycled may have contaminations on Cr surface, it is easyto remove them with a short and aggressive oxygen plasma with condition bellow:
Vacuum pressure: 230 mTorr
Gas flow:31 sccm
Time:600 sec
May I ask which photoresist, and whether it was exposed to UV or not? Since you mentioned negative I assume it most probably was SU8. If that's true, and it was exposed I'm afraid it won't be easy to remove it. If not exposed, first wash it with the appropriate developer and then IPA. After that leaving it in a hot (45°C) Acetone bath should clean it. If you do acetone do not forget to rinse it well with methanol and then DI water. Rinse immediately after taking it out of the bath, it in way that acetone does not have time to evaporate and leave residues.
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