Dear ResearchGate colleagues, professors, and scientists,
I'm encountering challenges with coated thin films produced using a sputtering system. Following treatment through tempering at 650 degrees, pinholes have emerged in the coated layer.
These pinhole defects are particularly noticeable around the edges of the glass surface after tempering.
I kindly request assistance in finding solutions to control these pinhole defects.
Thank you for your consideration.
Are you doing a cleaning procedure prior to deposition? I used to sputter on glass quite a bit and would do piranha clean prior to deposition to mitigate pinholes.
Good luck!
Dear colleague,
your question is not very detailed (What substrate?)and so is my answer:
I agree with Mr. Weidling. Cleanliness is key.There should be no outgassing from the substrate nor other sources in the chamber. I found some air plasma for cleaning and some HMDSO plasma polymerization for nucleation helpful.
If important, reconsider the question and go into literature starting from the 1950ies.
Best wishes,
Heinrich
Pinholes easily form in case you have arcing during the deposition process... Was your deposition process arc free ? Which thin film exactly ? How was it deposited ? Inert Ar deposition process or reactive process ???
Dear Paul Lippens,
The coated films are deposited by using large area magnetron sputtering under an inert (Ar) atmosphere.
The thin films are of multilayers using silicon and Chromium.
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