Good day all,
I am using hydrothermal synthesis to prepare a certain MOF and due to repeated synthesis and exposure to atmosphere there is a green layer that doesn't come off even when washed with concentrated HF. Is there anyway that i can clean this? Any input will be appreciated.
Thank you all for your time.
Please google out this article and hope it will be useful to you
Best regards,
Put 10mL of acid in vessel and seal. Ramp to 180°C in 10 minutes and hold for 10 minutes. Discard acid, rinse thoroughly with DI water, and allow to dry before next use.
by using chromic acid is the best way. dissolve potassium dichromate in conc. sulphuric acid. put for 30 mints on stirring then fill the teflon bottle and keep for 1-2hr. after it wash with soap and dil. nitric acid and rinse with DI water.
Thank you all for your suggestions.
For those who face similar issues - conc. HCl, DI and sand paper was used to clean the autoclave.
I was doping nitrogen to graphene oxide in teflon lined autoclave.
In one of the reactor a strong stone is formed.
Can anyone suggest any idea to remove this.
Reagent used
Urea and GO
Dssolve sodium dichromate (rough amount) in warm water and let the mixture seat for cooldown. after that concentrated sulfuric acid is added to this mixture and stirred gently (using a glass rod).
This solution mixture cleans any organic compounds from the surface of Teflon and glass.
after cleaning or removing the dirt, thoroughly rinse the Teflon or glass with warm water and double distilled water.
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