I prepared TiO2 thin film by dip coating method. FESEM images is showing the the four dipping rate result. The first one is lower pores and second one is max and third one is less than second one but more than first one. Fourth one is less than second and third one but more than first one. I took 1, 2, 3 and 4 cm/min dipping rate. How will i justify my result??
Give some specifications.
Do you prepare CBD bath and try to synthesize TiO2? Then It will effect by time . But cm/min unit is meaningless. It will depend on time only. Time by time growth rate will be more as per certain increase of nucleation sites. And you have almost uniform deposition throughout the dimension. Dipping time can effect for sure on CBD method. You have to optimize the time as well.
you can check my publications. In the attached papers, I have also optimized the time for optimum deposition.
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Bidhan Sir actually i m using dip coating method where 1 min is the dippping time and dipping speed is in unit of cm/min. So based on that what u r suggesting??
Are you using two precursors added in a single chemical bath and try dipping method?
Sritama well I don't think that you can justify since you have to precise enough that there should not be any manual error and moreover you have not mention your substrate in your question.
Look Sritama Roy
More dipping time causes more deposition of materials. Now Its hard to relate dipping rate and porous structure. At a specific dipping time, porosity will be maximum. Increase/decrease dipping time causes less porosity and surface area. So, you have to optimize the dipping time by comparative results. FESEM image gives a general idea, not the quantitative results. So, plz do BET and BJT to determine the surface area and pore distribution quantitatively. Then you can optimize the dipping time easily.
Go through the attached paper carefully. you'll have a whole idea.
http://pubs.acs.org/doi/abs/10.1021/am404422g
Sritama,
As the dipping rate increases your material which you want to deposit start growing through bottom-up approach. As we know that every body in its stable state having negative Gibb's free energy. therefore when you start dipping the substrate into the solution ion by ion the material which is of your concern got stuck over the substrate and took the shape (in nano regime) where it acquire minimum Gibbs free energy. Now almost every time shape is random which creates porosity in the material
This porosity found to be increases upto a certain level, beyond that level continuous dipping may form film of some micro regime.
There are lot of parameters which is to be concern, firstly concentration of your solution, stirring, working temperature, dipping time, more than that how you are performing the experiment.
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