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XRD peak is showing rutile phase of TiO2 during nanorod formation. But other than nanorod TiO2 means in the case of bulk or nanoparticles it is showing anatase phase. what is the actual reason...
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I prepared TiO2 thin film by dip coating method. FESEM images is showing the the four dipping rate result. The first one is lower pores and second one is max and third one is less than second one...
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Actually What type of hysteresis loop should be approprite for memristor such that it have maximum effeciency?? Means the width should be less or high ?? Then how we can optimize the thin film??...
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I am working on Third generation solar cell fabrication.
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