I need to deposit a thin film of Tin (Sn) with grain size less than 300 nm.
I think you need to optimize thin film deposition time because one fact is that if we increase the deposition time, the grain size increases. This may help you.
Increasing substrate temperature, and so atomic mobility of the Sn atoms as they reach the substrate, will work
Grain size can be vary with diff substrate tempt. And annealing the film.
Hi! you need to vary the deposition variables. E.g, use low substrate temperature
Which substrate will be used? If you deposit on an oxide substrate, like polished alumina, it is likely that Sn will grow in 3D island, especially if you keep the substrate hot. Another chance would be the pulsed laser deposition with ns pulsed laser
manipulation of grain size is possible with deposition parameters. for example, decrease substrate temperature, reduce deposition rate, if you want smaller grain size. You can find good insight in to nucleation and growth process in Chopra's book. You can also see many of our papers on aging in silver, copper particulate thin films.
The grain size depends on the deposition temperature: higher temperature - higher grain size. The grain size generally imfluenced also by inpurities that contribute to seconary phase formation and interruption of growth os grains. The impurity can be oxygen from the ambient in the chamber or intentioanally added additive. To some extent the grain size also dependes on the deposition rate influencing the incorporation ratio of oxygen imputity (higher rete - lower impurity level - larger grains). A great expert of this field is Peter Barna ([email protected]). he may give you somi hints on literature or specific advice for tin.
I think your problem is not very serious. with proper control of deposition parameters rain size can be controlled. A good understanding of nucleation and growth is essential, which you can acquire from books like Thin film Phenomena by Chopra.
In thermal evaporation several processing parameters such as substrate temperature, deposition rate, film thickness, ultimate vacuum, nature of substrate etc. has strong influence on the physical properties of the as-grown layers. In chemical methods, people go with capping agents for reducing the grain size but in physical methods there are different parameters to control the grain size.
I am also agree with the all, you will vary the substrate temperature, rate of deposition and variation of source to substrate distance.
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