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I want to simulate thermal stress of SiO2 generated from temperature source like heaters by joule heating. I have model where SiO2 membrane has heater on top. Because of heater temperature the...
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I want to coat monolayer of silica particles on W surface, but it is difficult to get mono-layer because of hydrophobic nature of surface. Tried Oxygen plasma treatment to get hydrophilic, but...
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There is a minimum energy requirement of substituting the host atom as compared to the interstitial position for the host atom. On which basis this is correct. Plz explain it.
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