I am working on fabrication of FTO thin films and unfortunately the sheet resistance that I am getting is not good at all. It's about 1000 ohm per square and I'm trying to reduce this amount to lower than 100 ohm.
If you have any idea or practical suggestion to solve this problem I would be thankful.
Do SEM imaging to know if your films are not porous and also confirm the crystallinity of films. Films shouldn't have much grain boundaries. Also, vary the thickness and optimize it. Optimize the Annealing temperature and annealing time.
I think Chandra's suggestions are very good. furthermore you can see additive and doping for this aim in papers.
When we have a TCO ,we must doped it for increase the conductivity ,the Fermi level may decale on the band conduction,the material will be degenerate,
The important thing of TCO that it combines between the conductivity and the transparence,the first is assured by the dopage(Al,Ga....) ,second is assured by the bandgap larger(all the wavelength photons)this lead to increase if the probability of absorption of photons phenomena.
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